The DST3 is a desk top, High Vacuum, triple target, turbo molecular vacuum pumped sputter coater, suitable for sputtering semiconductors, dielectrics, metals and metal oxides. The DST3 is equipped with a large chamber (300 mm diameter) and three 2” diameter water cooled cathodes which make it suitable for long time deposition. The magnetron desk sputter coater is equipped with RF and DC power supplies. It can sputter semiconductors, dielectrics and metal (oxidizing & noble) targets. The system is equipped with an auto adjustable matching box, minimizing the reflected power in the RF sputtering. For increasing film adhesion to the substrate and to improve the film structures, a 300 V, DC bias voltage can be applied to the substrate (optional).
Features:
| High vacuum turbo pump |
| Two stage rotary vane backing pump |
| Full range vacuum gauge Three 2” water – cooled sputtering cathodes Large chamber (300 mm diameter) suitable for large specimen depositions Target selection for multilayer thin films Co – sputtering to form alloy films Two quartz crystal monitoring system for real time thickness measurement (1 nm precision) Manual or automatic Timed and Thickness deposition |
| Cathode selection motor Sample rotation, height and tilt adjustable Intuitive touch screen to control the coating process and rapid data input |
| User friendly software that can be updated via network |
| Equipped with three manual shutter |
| Equipped with rotary sample holder with the ability of tilting in direction of cathodes |
| Unlimited sputtering time without breaking vacuum 500 °C substrate heater (optional) 300 V DC substrate bias voltages (optional) two-year warranty |
Applications:
| Metal, Semiconductor and Dielectric Films Nano & Microelectronic Solar cell applications Co-Sputtering processes Glad sputtering |
| Optical components coating |
| Thin film sensors |
| Magnetic thin film devices Fine grain structural deposition for SEM & FE-SEM sample preparation |
